QUANTUM-WIRE TRANSISTOR AT LOCALLY GROWN EDGES

Citation
F. Kaesen et al., QUANTUM-WIRE TRANSISTOR AT LOCALLY GROWN EDGES, Thin solid films, 321, 1998, pp. 106-110
Citations number
10
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
321
Year of publication
1998
Pages
106 - 110
Database
ISI
SICI code
0040-6090(1998)321:<106:QTALGE>2.0.ZU;2-L
Abstract
Quantum wires are conventionally realised with either high resolution lithography or with a complex process sequence involving many critical steps. In this work we report, for the first time, realisation of qua ntum wire transistors at locally grown edges, using molecular beam epi taxy (MBE) through micro shadow masks. This method does not require hi gh resolution lithography and simplifies the fabrication process. The fabricated devices were electrically characterised at room temperature and at liquid helium temperature for different applied magnetic field strengths. Oscillations are observed in the input characteristic at l iquid helium temperature. The magnetic field dependence of these oscil lations and Shubnikov-de Haas oscillations indicates, that quantum wir es with an effective width of 50 nm are realised due to field effect a t the locally grown edges. (C) 1998 Elsevier Science S.A. All rights r eserved.