EFFECT OF CU-DOPING ON THE MORPHOLOGY OF ZNTE FILMS ELECTRODEPOSITED FROM NONAQUEOUS BATH

Electrodeposition of Cu-doped ZnTe has been studied in a bath containi ng ZnCl2, TeCl4, KI and CuCl2 at 160 degrees C using cyclic voltammetr y in the dark and under illumination. X-ray diffraction as well as sca nning electron microscopy techniques have been employed to investigate the influence of deposition potential on the structure and surface mo rphology of the electrodeposit. It is shown that a mixed cubic as well as hexagonal ZnTe film is electrodeposited even at a potential lower than the equilibrium potential of Zn electrodeposition. Intermediate e lectrodeposition potential (-0.7 V to -0.75 V) favours growth of a mix ed Te and ZnTe phase. Compact, globular and single phase ZnTe can be g rown at -0.95 V. The atomic force microscopic examination of the ZnTe films deposited at -0.95 V indicated compact and close packed granular growth. (C) 1998 Elsevier Science S.A. All rights reserved.