THE EFFECTS OF IN-SITU PRETREATMENTS OF THE SUBSTRATE SURFACE ON THE PROPERTIES OF PLZT FILMS FABRICATED BY A MULTITARGET SPUTTERING METHOD

In this study, we investigated the effects of pretreatment of the subs trate surface on the deposition behavior and electrical properties of (Pb, La)(Zr, Ti)O-3 (PLZT) films deposited on the Pt/Ti/SiO2/Si substr ate by multi-target reactive sputtering. The pretreatments were carrie d out on the substrate by depositing single oxides (those of Pb, La, Z r or Ti) with a thickness of about 1 nm or less prior to the depositio n process of the PLZT film. After the pretreatments, PLZT films were d eposited under the same condition on the differently pretreated substr ates. The film composition, crystal structure, grain size and electric al properties of the PLZT films varied depending on the pretreatment. It was found that appropriate pretreatments on the substrate enhanced the incorporation of ph at the early stage of deposition and facilitat ed the nucleation of the perovskite phase, which suppressed the format ion of the Pb-deficient and Zr-rich interfacial layer and improved the electrical properties of the PLZT films. (C) 1998 Elsevier Science S. A. All rights reserved.