WATER-INDUCED DEGRADATION OF CHROMIUM FLUORIDE FILMS

Citation
En. Kim et al., WATER-INDUCED DEGRADATION OF CHROMIUM FLUORIDE FILMS, Thin solid films, 324(1-2), 1998, pp. 292-299
Citations number
15
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
324
Issue
1-2
Year of publication
1998
Pages
292 - 299
Database
ISI
SICI code
0040-6090(1998)324:1-2<292:WDOCFF>2.0.ZU;2-H
Abstract
As an optical film, chromium fluoride is an important material because it has good transparency in short wavelength region. However, it was found that chromium fluoride film degrades at humid condition. Therefo re, we investigated the degradation phenomena of chromium fluoride fil ms under 100% humid condition. The degraded samples were analyzed by s everal thin film analyzing techniques. With these results, we proposed a possible degradation mechanism consisting of multi-step reactions. First, H2O molecules are permitted to the porous structure in the film s to percolate through numerous microchannels and microvoids. Then, th e water molecules react with the chromium fluoride film to make hydrox ide bonding producing HF gas. HF gas evolves and gathers at some spots , and dome structure was developed. Chromium oxide precipitates around HF gas gathered dome. After time passes, HF gas evolution occurs foll owed by explosion of the dome structure, and crater-like feature remai ns as a result around the dome. It was found that the chromium oxide r ing is left around the feature. In the whole process, cracking also oc curred due to the molecular volume difference between CrFx and degrade d part. (C) 1998 Elsevier Science S.A. All rights reserved.