Jm. Zeng et al., PREPARATION AND FERROELECTRIC PROPERTIES OF BATIO3 THIN-FILMS BY ATMOSPHERIC-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 322(1-2), 1998, pp. 104-107
Ferroelectric BaTiO3 thin films have been prepared at atmospheric pres
sure on Si substrate by Metalorganic Chemical Vapor Deposition (MOCVD)
. Ba(DPM)(2) and titanium isopoproxide (TIP) were used as metalorganic
source. The microstructure and composition of the thin films were stu
died by XRD, SEM and EPMA, respectively. The prepared films at a subst
rate temperature of 700 degrees C on Si substrate showed polycrystalli
ne structure with smooth and uniform surface. The films have fully tex
tured with (001)-orientation after rapid thermal annealing, and have a
dielectric constant (epsilon) of 107 and the dissipation factor (tan
delta) of 0.08. The films exhibited remanent polarization (P-r) of 2.0
mu C cm(-1), and coercive field (E-c) of 4.0 kV cm(-1), from the P-E
hysteresis loop observation. The influence of substrate and stress to
the physical properties of the films was mainly discussed. A dispersiv
e Curie peak and the low-temperature-shifted Curie temperature were ob
tained from the epsilon-T curve, due to the existence of tensile stres
s on the films. (C) 1998 Elsevier Science S.A. All rights reserved.