PREPARATION OF CERIA THIN-FILMS AND MICROTUBES BY VAPOR-PHASE DEPOSITION USING NIO AS OXYGEN SOURCE

Authors
INABA M MINESHIGE A NAKANISHI S NISHIMURA I TASAKA A KIKUCHI K OGUMI Z
Citation
M. Inaba et al., PREPARATION OF CERIA THIN-FILMS AND MICROTUBES BY VAPOR-PHASE DEPOSITION USING NIO AS OXYGEN SOURCE, Thin solid films, 323(1-2), 1998, pp. 18-22
Citations number
27
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
323
Issue
1-2
Year of publication
1998
Pages
18 - 22
Database
ISI
SICI code
0040-6090(1998)323:1-2<18:POCTAM>2.0.ZU;2-A
Abstract
A modified version of electrochemical vapor deposition (EVD) using NiO as an oxygen source was applied to the fabrication of CeO2 thin films and microtubes. Cerium trichloride was used as a metal source, and Ni O pellets and surface-oxidized Ni wires of 125 mu m diameter as substr ates for deposition. Thin films of cubic CeO2 were formed on both subs trates by the vapor-phase reaction at 900 and 950 degrees C. Furthermo re, ceria microtubes of 130 mu m diameter were obtained by soaking the ceria-coated Ni wires in hydrochloric acid. (C) 1998 Elsevier Science S.A. All rights reserved.