NANOMECHANIC PROPERTIES OF EPITAXIAL ALPHA-FE FILMS GROWN ON CAF2(111) SI(111)/

Citation
N. Mattoso et al., NANOMECHANIC PROPERTIES OF EPITAXIAL ALPHA-FE FILMS GROWN ON CAF2(111) SI(111)/, Thin solid films, 323(1-2), 1998, pp. 178-182
Citations number
14
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
323
Issue
1-2
Year of publication
1998
Pages
178 - 182
Database
ISI
SICI code
0040-6090(1998)323:1-2<178:NPOEAF>2.0.ZU;2-S
Abstract
In this paper, we study the correlation between crystalline structure and nanomechanic properties of iron thin films grown on CaF2(111)/Si(1 11) as a function of deposition temperature. The results show a depend ence of in-plane residual strain with hardness and nanoscratch measure ments. The nanoindentation results show an increase of staircase behav ior upon increasing deposition temperature, indicating a correlation o f film crystal quality with mechanical behavior. From a structural poi nt of view, Fe films deposited at 450 degrees C are of the best qualit y. The biggest nanoscratch resistance was shown by a sample deposited at 150 degrees C, which has larger hardness and better adhesion. (C) 1 998 Elsevier Science S.A. All rights reserved.