THE CHEMICAL BONDING STATE OF NITROGEN IN KAPTON-DERIVED CARBON-FILM AND ITS EFFECT ON THE GRAPHITIZATION PROCESS

Citation
M. Inagaki et al., THE CHEMICAL BONDING STATE OF NITROGEN IN KAPTON-DERIVED CARBON-FILM AND ITS EFFECT ON THE GRAPHITIZATION PROCESS, Carbon (New York), 36(7-8), 1998, pp. 1021-1025
Citations number
14
Categorie Soggetti
Chemistry Physical","Material Science
Journal title
ISSN journal
00086223
Volume
36
Issue
7-8
Year of publication
1998
Pages
1021 - 1025
Database
ISI
SICI code
0008-6223(1998)36:7-8<1021:TCBSON>2.0.ZU;2-R
Abstract
The chemical bonding state of the nitrogen which remains in the carbon films derived from a polyimide Kapton film was studied by X-ray photo electron spectroscope and related to the changes in structure and tran sport properties. The nitrogen remaining after heal treatment up to 22 00 degrees C was in a tertiary bonding state, replacing carbon atoms i n hexagonal layers, which was supported by theoretical calculation bas ed on ab-initio molecular orbital theory. The departure of substituted nitrogen atoms from hexagonal layers showed a good correspondence wit h structure development and changes in transport properties, the prese nce of nitrogen depressing the developments in structure and transport properties. After the departure of nitrogen above 2300 degrees C grap hitization of the films was very remarkable. (C) 1998 Elsevier Science Ltd. All rights reserved.