LOW-TEMPERATURE THERMAL CVD OF TI-AL METAL-FILMS USING A STRONG REDUCING AGENT

Authors
LUDVIKSSON A NOONEY M BRUNO R BAILEY A KODAS TT HAMPDENSMITH MJ
Citation
A. Ludviksson et al., LOW-TEMPERATURE THERMAL CVD OF TI-AL METAL-FILMS USING A STRONG REDUCING AGENT, CHEMICAL VAPOR DEPOSITION, 4(4), 1998, pp. 129-132
Citations number
16
Categorie Soggetti
Materials Science, Coatings & Films",Electrochemistry,"Physics, Condensed Matter
Journal title
CHEMICAL VAPOR DEPOSITION → ACNP
ISSN journal
09481907
Volume
4
Issue
4
Year of publication
1998
Pages
129 - 132
Database
ISI
SICI code
0948-1907(1998)4:4<129:LTCOTM>2.0.ZU;2-1