Modeling of effective densities of states N-V,N-SiGe in heterojunction
bipolar transistor is presented, based on accurate determination of h
ole effective mass m(p). Algorithm for calculation of hole effective
mass m(p) is presented, which is optimized for numerical device model
ing. Corresponding Fortran subroutine named HEM is discussed, which ca
lculates hole effective mass in the temperature range of T=77K-300K, b
ase doping level bellow 10(20) cm(-3) and germanium content x(Ge)=0,00
-0,30. Finally, Fortran subroutine HEM is incorporated into numerical
device simulator MEDICI and tested through simulation of idealized het
erojunction bipolar transistor.