The adsorption of an O adatom on the most stable hydrogenated Si clust
er (Si6H12) has been explored for the first time by using first princi
ples. Two interesting adsorption configurations are found: In the firs
t one, a striking feature is the substitutional adsorption: the O adat
om forms a bond with a Si atom in the substrate cluster, which release
s a H atom, and the H atom is in turn bonded to the adatom, exhibiting
a similar feature to the Si adatom on the hydrogenated Si(100) surfac
e. In the second one, the O adatom breaks the Si-Si bond and is bridge
-bonded to two Si atoms, which not only exhibits the key structural fe
ature for Si oxide clusters with ring and chain structure, but also di
splays the characteristics of oxidation of the Si(001) surface and oxy
gen impurities in bulk silicon. The latter structure is more stable th
an the former.