AN ALGORITHM FOR DEPTH-DOSE CURVES OF ELECTRONS FITTED TO MONTE-CARLODATA

An accurate algorithm has been developed for the depth profiles of ene rgy deposition by plane-parallel electron beams normally incident on s emi-infinite absorbers. The energies of electrons considered are from 0.1 to 20 MeV, and the absorbers considered are elemental materials of atomic numbers between 4 and 92. Adjustable coefficients in the algor ithm have been determined so as to minimize its deviations from the Mo nte Carlo data published by Tabata et al. (1994). The algorithm is als o applicable to light compounds and mixtures. (C) 1998 Elsevier Scienc e Ltd. All rights reserved.