We have performed high dose carbon ion implantation into polycrystalli
ne silver substrates at high temperature (500-600 degrees C). The form
ation of a high density of spherical carbon onions on the nearby silve
r substrate was characterized by atomic force microscopy experiments a
nd transmission electron microscopy. The influence of the implantation
temperature as well as that of silver grain sizes and crystallographi
c orientations are analysed. (C) 1998 Published by Elsevier Science Lt
d. All rights reserved.