IMPROVEMENT OF GMR CHARACTERISTICS IN [NI81FE19 CU] MULTILAYERS BY INTERFACIAL MODULATION TECHNIQUE USING KR IONS/

Ni81Fe19/Cu multilayers with giant-magnetoresistive effect were deposi ted by dual ion beam sputtering method. Interfacial modulation techniq ue using Ar or Kr ion bombardment to the interfaces of Ni-Fe/Cu multil ayers could change the interfacial conditions, such as sharp interface , local mixing and interfacial diffusion. Kr was used as sputtering ga s to reduce the damage of growing films by recoiled particles. The eff ect of Kr ion bombardment to the interfaces at restricted acceleration voltage of 100 V and reduction of residual stress seems to be effecti ve for decreasing the film resistivity and increasing the MR ratio up to 17.8 % at room temperature.