CPP (Current perpendicular-to-plane) magnetotransport measurements hav
e been performed on lithographically patterned magnetic multilayers of
NiFeCo/Cu/CoFe/Cu, We implement chemical-mechanical polishing produce
very low Cu-Cu interface resistance that allows accurate, intrinsic g
iant magnetoresistance (GMR) values to be obtained, Measured GMR is fo
und to be dependent on device size but can be interpreted as the chang
e in the resistivity of the magnetic multilayer and the effects of non
uniform current distribution. Computer simulations account for the non
-uniform current distribution and allow us to determine the intrinsic
CPP GMR and verify the negligible contact resistance in these structur
es.