PROCESS MONITORING OF SPIN-VALVE GMR DEPOSITION

Authors
KOOLS JCS PARANJPE AP SCHWARTZ PV BUBBER R BERGNER B KULA W RIJKS TGSM
Citation
Jcs. Kools et al., PROCESS MONITORING OF SPIN-VALVE GMR DEPOSITION, IEEE transactions on magnetics, 34(4), 1998, pp. 945-947
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
Journal title
IEEE transactions on magnetics → ACNP
ISSN journal
00189464
Volume
34
Issue
4
Year of publication
1998
Part
1
Pages
945 - 947
Database
ISI
SICI code
0018-9464(1998)34:4<945:PMOSGD>2.0.ZU;2-#
Abstract
A phenomenological description of the conductance of a spin-valve stru cture is developed and compared to numerical solutions for the Boltzma nn equation, Based on the phenomenological description, a method is pr esented to measure the controllability of physical vapor deposition of sub-100 ii Cu films with better than 0.5 Angstrom accuracy.