REVERSIBLE ELECTRODEPOSITION OF ULTRATHIN MAGNETIC CO FILMS

Citation
W. Schindler et al., REVERSIBLE ELECTRODEPOSITION OF ULTRATHIN MAGNETIC CO FILMS, IEEE transactions on magnetics, 34(4), 1998, pp. 963-967
Citations number
17
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189464
Volume
34
Issue
4
Year of publication
1998
Part
1
Pages
963 - 967
Database
ISI
SICI code
0018-9464(1998)34:4<963:REOUMC>2.0.ZU;2-8
Abstract
Ultrapure preparation conditions equivalent to ultrahigh vacuum condit ions of 5 x 10(-10) mbar allow the reproducible deposition of magnetic films in the monolayer (ML) range from aqueous electrolytic solutions . We used this cost and time efficient technique to prepare ultrathin Ca films on Cu(001) substrates. A unique feature of electrodeposition is its ability to dissolve previously deposited layers. The thickness of deposited films can be adjusted in situ by dissolution without dama ging the rest of the film. This might be useful in precisely tailoring film properties, for example in magnetic multilayers. In situ magneto -optical Kerr effect (MOKE) measurements are a simple and efficient to ol for such a purpose and provide a thickness resolution of better tha n 0.2 ML. The magnetic properties and anisotropies of the electrodepos ited films as derived from our in situ MOKE measurements are mainly de termined by their epitaxial growth on Cu(001).