FABRICATION OF LARGE-AREA NANOSTRUCTURED MAGNETS BY INTERFEROMETRIC LITHOGRAPHY

Authors
FARHOUD M HWANG M SMITH HI SCHATTENBURG ML BAE JM YOUCEFTOUMI K ROSS CA
Citation
M. Farhoud et al., FABRICATION OF LARGE-AREA NANOSTRUCTURED MAGNETS BY INTERFEROMETRIC LITHOGRAPHY, IEEE transactions on magnetics, 34(4), 1998, pp. 1087-1089
Citations number
17
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
Journal title
IEEE transactions on magnetics → ACNP
ISSN journal
00189464
Volume
34
Issue
4
Year of publication
1998
Part
1
Pages
1087 - 1089
Database
ISI
SICI code
0018-9464(1998)34:4<1087:FOLNMB>2.0.ZU;2-6
Abstract
Patterned arrays of magnetic elements maybe useful as media for high d ensity magnetic storage applications. Interferometric lithography has been used to fabricate arrays of cobalt and nickel pillars with period s of 200 nm over areas of 5 cm x 5 cm using a UV laser. This provides an economical and rapid method for manufacturing particle arrays.