S. Melinte et al., NANOLITHOGRAPHIC PATTERNING OF THIN METAL-FILMS WITH A SCANNING PROBEMICROSCOPE, Superlattices and microstructures, 24(1), 1998, pp. 79-82
Using an atomic force microscope (AFM) operating in air, we locally mo
dify thin films of e-beam-deposited Cr and Ti by applying voltage puls
es between the AFM tip and the sample, which is positively biased with
respect to the tip. The modifications consist in anodization and/or m
echanical deformation and reach the metal/substrate interface. Metalli
c gates can thus be fabricated without pattern transfer. (C) 1998 Acad
emic Press.