GROWTH OF BN BY HOT-FILAMENT ASSISTED ELECTRON-BEAM DEPOSITION

Citation
S. Manorama et al., GROWTH OF BN BY HOT-FILAMENT ASSISTED ELECTRON-BEAM DEPOSITION, Journal of physics. D, Applied physics, 26(10), 1993, pp. 1793-1795
Citations number
15
Categorie Soggetti
Physics, Applied
ISSN journal
00223727
Volume
26
Issue
10
Year of publication
1993
Pages
1793 - 1795
Database
ISI
SICI code
0022-3727(1993)26:10<1793:GOBBHA>2.0.ZU;2-7
Abstract
Thin films of BN were deposited using an electron beam for evaporating boron and a hot filament for activating N2. The IR spectrum of the de posited film on Si substrates showed a strong absorption at 1097 cm-1 clearly indicating a cubic structure. Scanning electron micrograph and x-ray diffraction patterns confirm the polycrystalline nature of the films. Raman spectra of the films showed peaks at 1056 and 1304 cm-1, which are the characteristic Raman lines for cubic boron nitride.