M. Maazouz et al., ELECTRON-CAPTURE AND LOSS IN THE SCATTERING OF FLUORINE AND CHLORINE ATOMS AND IONS ON METAL-SURFACES, Surface science, 409(2), 1998, pp. 189-198
We present the results of a study of collisions of 0.5-4 keV fluorine
and chlorine negative ions and atoms with Mg, Al and Ag surfaces. Prod
uction of negative and positive ions is observed. An electron spectros
copy study aimed at identifying excitation of autoionizing states was
performed. We report scattered ion fractions as a function of energy a
nd exit angle with respect to the surface. For these high electron aff
inity systems, the negative ion fractions are very large. Their angula
r dependence indicates the existence of a loss process. At low energie
s the ion fractions can be described using existing calculations [P. N
ordlander, N.D. Lang, Phys. Rev. B, 46 (1992) 2584] of widths of the n
egative ion stales in front of a metal surface, once the multielectron
nature of the problem, i.e. the fact that the halogen ions have six e
ssentially equivalent electrons. is properly taken into account. (C) 1
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