THE EFFECT OF AN ELECTRODE ON PLASMA POTENTIAL DIP IN RIKEN 18 GHZ ELECTRON-CYCLOTRON-RESONANCE ION-SOURCE

Authors
NAKAGAWA T BIRI S KIDERA M MIYAZAWA Y HEMMI M CHIBA T INABE N KASE M KAGEYAMA T KAMIGAITO O GOTO A YANO Y
Citation
T. Nakagawa et al., THE EFFECT OF AN ELECTRODE ON PLASMA POTENTIAL DIP IN RIKEN 18 GHZ ELECTRON-CYCLOTRON-RESONANCE ION-SOURCE, JPN J A P 2, 37(5B), 1998, pp. 619-621
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS → ACNP
Volume
37
Issue
5B
Year of publication
1998
Pages
619 - 621
Database
ISI
SICI code
Abstract
We measured the beam intensity of argon ions as a function of negative bias voltage of an electrode under the pulsed mode operation. We obse rved that the potential dip becomes deeper by increasing negative bias voltage. We concluded that the electrode works to optimize the plasma potential and helps to increase the beam intensity of highly charged argon ions.