REACTIVITY OF PERFLUORO-N-ALKYL RADICALS WITH RELUCTANT SUBSTRATES - RATES OF ADDITION TO RFCH2CH=CH2 AND RFCH=CH2

Authors
DELEST B SHTAREV AB DOLBIER WR
Citation
B. Delest et al., REACTIVITY OF PERFLUORO-N-ALKYL RADICALS WITH RELUCTANT SUBSTRATES - RATES OF ADDITION TO RFCH2CH=CH2 AND RFCH=CH2, Tetrahedron, 54(32), 1998, pp. 9273-9280
Citations number
15
Categorie Soggetti
Chemistry Inorganic & Nuclear
Journal title
Tetrahedron → ACNP
ISSN journal
00404020
Volume
54
Issue
32
Year of publication
1998
Pages
9273 - 9280
Database
ISI
SICI code
0040-4020(1998)54:32<9273:ROPRWR>2.0.ZU;2-P
Abstract
Conditions for conducting competitive experiments involving slow react ions of perfluoroalkyl radicals have been defined. A revised value for the rate constant for hydrogen abstraction from Et3SiH is reported [( 5.0 +/- 0.4) x 10(5) M(-1)s(-1)], as we the rate, constants for additi on of the n-C4F9. radical to CH2=CHCH2C4F9 [1.15 +/- 0.11) x 10(6) M(- 1)s(-1)] and to CH2=CHC4F9 [2.6 +/- 0.2) x 105 M(-1)s(-1)] at 25 degre es C. (C) 1998 Elsevier Science Ltd. All rights reserved.