EMISSION OF SECONDARY IONS FROM 3D, 4D, AND 5D TRANSITION-METALS UNDER CHLORO-TRIFLUORO-METHANE CCLF3 AS REACTANT GAS

Citation
B. Schlosser et W. Seidel, EMISSION OF SECONDARY IONS FROM 3D, 4D, AND 5D TRANSITION-METALS UNDER CHLORO-TRIFLUORO-METHANE CCLF3 AS REACTANT GAS, Fresenius' journal of analytical chemistry, 361(5), 1998, pp. 433-436
Citations number
14
Categorie Soggetti
Chemistry Analytical
ISSN journal
09370633
Volume
361
Issue
5
Year of publication
1998
Pages
433 - 436
Database
ISI
SICI code
0937-0633(1998)361:5<433:EOSIF3>2.0.ZU;2-Q
Abstract
Surface interactions of CClF3 with polycrystalline samples of Ti, V, C r, Mn, Fe, Co, Ni, Cu, Nb, Mo, Ph, Pd, Ag, Ta, W, Re, Ir, and Pt were investigated by means of moderate dynamic SIMS. As observed with other reactant gases these transition metals in most cases appear to be dis cernible into ''dissociative'' and (partial) ''molecular'' adsorbents. Small signals of oxidic secondary ions which are detectable for resid ual gas conditions vanished under the action of CClF3. However, due to strong polarization by either of the halogens, the emission of Me2+ i ons is enhanced for Ti, V, and Nb.