THE AES AND EELS STUDY OF THIN ALUMINA FILMS DEPOSITED ON NIOBIUM

The polycrystalline niobium was used as a substrate for thin alumina f ilms deposition. A special Knudsen cell was constructed for this purpo se. The atomic purity of both the substrate and the deposited film was controlled by Auger Electron Spectroscopy (AES) and Electron Energy L oss Spectroscopy (EELS). The evaporated films were compared with the c lean stoichiometric alpha-Al2O3 with (11 (2) over bar 0) surface orien tation. Although alumina depositions were carried out with different e vaporation rates we have observed no traces of dissociation of the alu mina or the deposition of undesirable atoms on the investigated surfac e. (C) 1998 Elsevier Science Ltd. All rights reserved.