An advanced displacement measuring interferometer system has been deve
loped to satisfy the needs of semiconductor manufacturing and lithogra
phy. The system electronics provides a position resolution of 0.31 nm
at velocities up to 2.1 m s(-1) when the system is used with a double-
pass interferometer. Output data rates up to 10(7) samples per second
are available. The data age, which is the delay from the interferomete
r optics to the measurement sample, can be adjusted to equalize differ
ences between axes to within 1 ns. This low data age uncertainty is ne
cessary for high-resolution, high-speed, multiple-axis measurements.