H. Kim et al., COMPARISON OF CORROSION RESISTANCES BETWEEN FE2O3-TIO2 ARTIFICIAL PASSIVATION FILM AND PASSIVATION FILM ON FE-TI ALLOY, Journal of the Electrochemical Society, 145(8), 1998, pp. 2818-2826
Citations number
26
Categorie Soggetti
Electrochemistry,"Materials Science, Coatings & Films
Fe2O3-TiO2 double-oxide films were formed on Pt substrates by low-pres
sure metallorganic chemical vapor deposition using iron acetylacetonat
e and tetraisopropoxytitanium as precursors and O-2 as a reaction gas.
Fe-Ti alloys were fabricated by an ion-beam sputter and an are-meltin
g process. The corrosion resistances of the Fe2O3-TiO2 films and the F
e-Ti alloys were examined in acid solutions. The thinning rate of the
Fe2O3-TiO2 films in 5 M HCl decreased with an increase in the formatio
n temperature. Likewise, the dissolution rate decreased with increasin
g titanium cationic fraction in the films. The films hardly dissolved
at anodic potentials, while significant dissolution occurred at cathod
ic potentials in 1 M H2SO4 owing to the selective reduction of iron ox
ide components in the films. Sputter-deposited Fe-Ti alloy films conta
ining more than 39 atom % Ti and are-melted Fe-Ti alloys containing, m
ore than 57 atom % Ti showed high corrosion resistance when passivated
anodically in 5 M HCl. The dissolution rates of the Fe2O3-TiO2 films
in 5 M HCl appear to be significantly small er than those of the passi
ve films on the Fc-Ti alloy films and the Fe-Ti alloys in the same sol
ution.