OPTICAL DEFLECTION SETUP FOR STRESS MEASUREMENTS IN THIN-FILMS

Authors
BICKER M VONHULSEN U LAUDAHN U PUNDT A GEYER U
Citation
M. Bicker et al., OPTICAL DEFLECTION SETUP FOR STRESS MEASUREMENTS IN THIN-FILMS, Review of scientific instruments, 69(2), 1998, pp. 460-462
Citations number
10
Categorie Soggetti
Physics, Applied","Instument & Instrumentation
Journal title
Review of scientific instruments → ACNP
ISSN journal
00346748
Volume
69
Issue
2
Year of publication
1998
Part
1
Pages
460 - 462
Database
ISI
SICI code
0034-6748(1998)69:2<460:ODSFSM>2.0.ZU;2-X
Abstract
We demonstrate an optical two-beam deflection setup for irt situ stres s measurements in thin films. By using improved position sensitive pho todetectors we reach a resolution of better than 10(-4) m(-1) for subs trate curvature measurement at a bandwidth of 1 kHz, with a relatively short optical path of 0.53 m and without employing a lock-in techniqu e. (C) 1998 American Institute of Physics.