W. Wesch et al., INVESTIGATION OF RADIATION-DAMAGE IN ION-IMPLANTED KTIOPO4, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 141(1-4), 1998, pp. 338-342
The damage production in potassium titanyl phosphate KTiOPO4 (KTP) was
investigated for Li+, N+, Ar+ and Er+ ion implantation at different e
nergies by means of the Rutherford backscattering (RBS) channeling spe
ctrometry. Selected samples were furnace annealed at 650 degrees C. Th
e damage production in the case of Li+-implantation follows the profil
e of the nuclear energy deposition. A continuous damage evolution obse
rved in the case of N+ and Ar+ implantations can be correlated with th
e electronic energy loss. The results indicate that damaging due to el
ectronic excitation obviously occurs if a certain value of the electro
nic energy loss per incident ion is exceeded. For Er+-implantation bot
h energy deposition processes seem to contribute to damaging. The find
ings are related to the binding energies reported for KTP crystals. (C
) 1998 Elsevier Science B.V. All rights reserved.