(TA SI) MULTILAYER AS A WIDE-BANDPASS MONOCHROMATOR MATERIAL/

Authors
PARK YJ YOUN HS BANERJEE S LEE DR BAIK HM LEE KB KIM KJ MOON DW
Citation
Yj. Park et al., (TA SI) MULTILAYER AS A WIDE-BANDPASS MONOCHROMATOR MATERIAL/, Journal of synchrotron radiation, 5, 1998, pp. 705-707
Citations number
12
Categorie Soggetti
Instument & Instrumentation","Physics, Applied",Optics
Journal title
Journal of synchrotron radiation → ACNP
ISSN journal
09090495
Volume
5
Year of publication
1998
Part
3
Pages
705 - 707
Database
ISI
SICI code
0909-0495(1998)5:<705:(SMAAW>2.0.ZU;2-E
Abstract
Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)( 60) multilayer sample were measured to characterize its interface stru cture. Since the multilayer has a good reflectance at its multilayer p eaks, its performance as a wide-bandpass monochromator for X-ray scatt ering experiments of polymers has been tested.