ELECTRON-BEAM WRITING OF LARGE-AREA FRESNEL ZONE PLATES

High-resolution X-ray microscopy requires advanced fabrication technol ogy for Fresnel zone plates (FZPs). As the resolution of an FZP depend s on the width of the outermost zone, fine zone patterns for objective lenses have to be replicated. On the other hand, to achieve highly co ndensed X-ray beams by using FZPs for condenser lenses, large-held rep lication is required. A method of pattern replication of FZPs for X-ra y microscopy is reported. Utilizing a 30 keV electron-beam writing too l and an FZP-generation computer program, FZP patterns for a condenser lens 1 mm in diameter with an outermost-zone width of 0.2 mu m and fo r an objective lens 0.5 mm in diameter with an outermost-zone width of 0.1 mu m were replicated.