A COMPACT UHV X-RAY DIFFRACTOMETER FOR STUDYING SURFACES AND INTERFACES
Citation
Y. Fujii et al., A COMPACT UHV X-RAY DIFFRACTOMETER FOR STUDYING SURFACES AND INTERFACES, Journal of synchrotron radiation, 5, 1998, pp. 887-889
Categorie Soggetti
Instument & Instrumentation","Physics, Applied",Optics
SICI code
0909-0495(1998)5:<887:ACUXDF>2.0.ZU;2-W
Abstract
A compact ultra-high-vacuum (UHV) X-ray diffractometer for surface gla
ncing X-ray scattering has been constructed. All the equipment, includ
ing a rotating-anode source of 18 kW and a UHV specimen chamber, is ar
ranged on one optical table of dimensions 70 x 90cm. The specimen cham
ber is 14cm in diameter and 20 cm high and can be evacuated up to 3 x
10(-8) Pa. It is equipped with two Be windows of thicknesses 0.2 and 0
.4 mm. Specimen orientation in the vacuum is controlled from the outsi
de. The specimen can be heated up to 773 K. The chamber has two evapor
ation cells and can be used for in situ observations of growing crysta
l surfaces. Using this instrument, we observed a mechanically polished
Ag surface and successfully made an in situ observation of the layer-
by-layer growth of a PbSe(111) surface. The instrument will be useful
for preliminary experiments using laboratory sources, prior to final m
easurements at synchrotron radiation facilities.