SUBMICROMETER-AREA HIGH-ENERGY-RESOLUTION PHOTOELECTRON-SPECTROSCOPY SYSTEM

A submicrometre-area photoelectron spectroscopy system that uses a mul ti-layer-coated Schwarzschild objective as the soft X-ray microbeam op tics has been developed. The system is located at an undulator beamlin e (BL-16U) at the Photon Factory in the High Energy Accelerator Resear ch Organization. By knife-edge measurement, the microbeam size was est imated to be 160 nm at the sample position using a 25-75% criterion. P hotoelectron spectral measurements revealed that the Fermi edge width was 0.12 eV, which means that the instrumental resolution was 0.05 eV, after removing the natural broadening of the Fermi edge at room tempe rature. This system offers both high energy resolution and high spatia l resolution.