SOL-GEL PREPARATION OF BI2MXV1-XO5.5-DELTA FILMS (M = CU, NB X = 0.1,0.3)

Citation
Jw. Pell et al., SOL-GEL PREPARATION OF BI2MXV1-XO5.5-DELTA FILMS (M = CU, NB X = 0.1,0.3), Chemistry of materials, 10(7), 1998, pp. 1764-1770
Citations number
35
Categorie Soggetti
Chemistry Physical","Material Science
Journal title
ISSN journal
08974756
Volume
10
Issue
7
Year of publication
1998
Pages
1764 - 1770
Database
ISI
SICI code
0897-4756(1998)10:7<1764:SPOBF(>2.0.ZU;2-X
Abstract
The sol-gel deposition of Bi2Cu0.1V0.9O5.35 (BiCUVOx) and Bi2Nb0.3V0.7 O5.5 (BiNbVOx) films up to 2 mu m thick onto quartz substrates is repo rted. Films of both materials can be deposited, initially crack-free, on quartz. Bi2Nb0.3V0.7O5.5 films on quartz remain homogeneous and def ect-free at all temperatures, but Bi2CU0.1V0.9O5.35 films develop groo ves and voids between grains during thermal processing. A number of ad ditives were tested with the BiCuVOx precursor solutions for their eff ects on film morphology and were found to give no improvement in the f ilm quality. Process temperature and alkoxide/hydrolysis water ratio w ere varied as well. Preliminary results for deposition of the films on to porous alumina substrates are reported.