Intrinsic and extrinsic stacking faults along the [111] direction in c
ubic SiC, Si, and C are studied within a first-principles scheme based
on density-functional theory and the local-density approximation. In
contrast to stacking fault energies for Si and C, we find them to be n
egative for SiC, possibly one part of the explanation for the large va
riety of hexagonal and rhombohedral polytypes. The formation energies
are compared with experimental and theoretical data available and the
chemical trends are derived for the geometrical changes. The electroni
c structure is calculated for the energetically favorable stacking fau
lts in SiC. [S0163-1829(98)01627-0].