MULTICUSP SOURCES FOR ION-BEAM PROJECTION LITHOGRAPHY

Citation
Y. Lee et al., MULTICUSP SOURCES FOR ION-BEAM PROJECTION LITHOGRAPHY, Review of scientific instruments, 69(2), 1998, pp. 877-879
Citations number
5
Categorie Soggetti
Physics, Applied","Instument & Instrumentation
ISSN journal
00346748
Volume
69
Issue
2
Year of publication
1998
Part
2
Pages
877 - 879
Database
ISI
SICI code
0034-6748(1998)69:2<877:MSFIPL>2.0.ZU;2-N
Abstract
Multicusp ion sources are capable of producing positive and negative i ons with good beam quality and low energy spread. The ion energy sprea d of multicusp sources has been measured by three different techniques . The axial ion energy spread has been reduced by introducing a magnet ic filter inside the multicusp source chamber which adjusts the plasma potential distribution. The axial energy spread is further reduced by optimizing the source configuration. Values as low as 0.8 eV have bee n achieved. (C) 1998 American Institute of Physics.