VACUUM-ARC ION AND PLASMA SOURCE RADUGA-5 FOR MATERIALS TREATMENT

This article describes a new modification of high current ion and plas ma source Raduga 5. A dc vacuum are is used to generate plasma. Genera tion of accelerated ion beams is realized in the Raduga 5 in a repetit ively pulsed mode with the pulse repetition rate up to 200 pps, the pu lse duration up to 400 mu s and the accelerating voltage up to 50 kV. To clean the vacuum are plasma from the microparticle fraction of the products of the explosive cathode emission of the are evaporator a new version of a straight-line plasma filter is used. This article descri bes a new version of the accelerating diode which works under conditio ns of high thermal loads with a continuous metal plasma flow and repet itively pulsed formation of an accelerated ion beams. A simultaneous g eneration of a metal plasma how and pulse beams of accelerated ions in the Raduga 5 source ensures realization of the technologies of an ion assisted metal plasma deposition, ion implantation under ion sputteri ng compensation by metal plasma deposition and ion implantation. The e xperimental data on different technological regimes of the source are presented in this article. Potential areas of the perspective applicat ion of the ion and plasma source Raduga 5 of ion and ion-plasma treatm ent of different materials are discussed. (C) 1998 American Institute of Physics.