The requirements of ion sources (IS) for ion-beam treatment (IBT) of h
igh precision optical parts are substantiated. The ion source feature
is presented. There are developed and investigated differences for ion
-optical systems forming the beams featuring preset ion current distri
bution and cross section (on the 0.1 level) in the range from 5 to 30
mm. The ion beam characteristics are measured. IS has been tested whil
e processing different materials. The source is recommended for employ
ment in installations designed for automatic microsize processing of h
igh precision optical parts. (C) 1998 American Institute of Physics.