The effect of cesium vapor partial pressure on the plasma parameters h
as been studied in a de hydrogen negative ion source. The cesium vapor
pressure was varied up to 10(-5) Torr and was determined by a surface
ionization gauge in the absence of the discharge. Due to cesium seedi
ng the negative ion relative density in the center of the plasma extra
ction region increases by a factor of 4, while the electron density de
creases. The negative ion density increase is highest (a factor of 2)
at the lowest hydrogen pressure. The velocity of the directed negative
ion flow to the plasma electrode is also increased by the cesium seed
ing. Due to these factors the negative ion current is enhanced. A dram
atic reduction of the electron component, which is consistent with the
reduced electron density and temperature, is also observed. An enhanc
ement of the volume production seems to occur in this type of plasma.
Possible mechanisms for this type of volume process will be discussed.
(C) 1998 American Institute of Physics.