A volume source based on the high efficiency source is being developed
for heavy ion production. Bismuth was chosen for exemplifying investi
gations because of its low melting point. The ion source is driven by
an are discharge ionizing bismuth atoms which are evaporated from an o
ven inside the source chamber. It has been optimized to produce a beam
with a fraction of singly ionized bismuth above 92%. A multiaperture
extraction system was built consisting of seven holes with a radius of
3 mm each. For that system, the perveance limit was achieved at a bea
m current of 70 mA and an extraction voltage of 27.5 kV. The correspon
ding emission current density amounts to 35 mA/cm(2). This value was o
btained for an are power of only 280 W. Furthermore, the emittance of
a beam extracted from the multiaperture extraction system has been det
ermined with a high power emittance scanner. It amounts to 0.27 pi mm
mrad (80%, normalized, 4 rms). In this case, the emittance of a single
beam is 0.017 pi mm mrad. This article will give a detailed descripti
on of both the source and the experimental setup. In addition, various
dependencies between the plasma parameters and the beam composition a
re presented. (C) 1998 American Institute of Physics.