ION-SOURCE DEVELOPMENT AT GSI

Different ion sources are used at GSI to match the requirements for sp ecific tasks at the accelerator. At the standard injector a Penning io nization gauge ion source is used(design ion U10+, mig < 24, 1 emA). F urther development of this source is mainly aiming at an increase of t he extractable currents and an increase of the Lifetime of the source. The new injector produces the beam by means of an electron cyclotron resonance source (Caprice-type). Here the design ion is U28+, m/q<8.5, 5 e mu A. Clearly, the oven technology is our main development goal. In addition we are trying to improve the extraction flexibility by a m oveable accel-decel system. For our high current project ion sources a re required which are capable to deliver a beam of several mA even for heavy ions. Design ion here is U4+, m/q<65, 15 emA. For that applicat ion two different types of ion source are used: the multicusp ion sour ces ''cold or hot reflex discharge ion source'' and ''multicusp ion so urce'' for gaseous ions and the MEVVA source for metal beams. (C) 1998 American Institute Physics.