OPTICAL-CONSTANTS AND GROWTH MODE OF NI FILMS DEPOSITED ON EVAPORATEDAL, AG AND CU FILMS

Citation
K. Hanamoto et al., OPTICAL-CONSTANTS AND GROWTH MODE OF NI FILMS DEPOSITED ON EVAPORATEDAL, AG AND CU FILMS, Surface science, 409(3), 1998, pp. 413-420
Citations number
52
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
409
Issue
3
Year of publication
1998
Pages
413 - 420
Database
ISI
SICI code
0039-6028(1998)409:3<413:OAGMON>2.0.ZU;2-B
Abstract
Information about the optical constants and structures of Ni films in Ni/Al(AlOx. Al), Ni/Ag and Ni/Cu(CuOx. Cu) bilayer systems are obtaine d through an attenuated total reflection (ATR) analysis, scanning elec tron spectroscopy (SEM) observation and the X-ray diffraction measurem ents. In particular, the optical constants of the Ni films are evaluat ed at various stages of growth. It is finally concluded that the Ni fi lms show island growth for the Ni/Al(AlOx. Al) and Ni/CuOx. Cu bilayer s, whereas layer-by-layer growth is found for the Ni films in the Ni/C u system. It is confirmed from SEM images that the Ni him on the Ag hi m shows island growth, but the ATR experimental results indicate that it becomes continuous at a very early stage of growth. (C) 1998 Elsevi er Science B.V. All rights reserved.