High-quality InAs epitaxial layers have been grown on (1 0 0) oriented
semi-insulating GaAs substrates by MBE. The transport properties of l
argely lattice mismatched InAs/GaAs heterojunctions have been investig
ated by Hall effect measurements down to 10 K. In spite of a high disl
ocation density at the heterointerface, very high electron mobilities
are obtained in the InAs thin films. By doping Si into the layer far f
rom the InAs/GaAs interface, we found that the doped samples have high
er electron mobility than that of the undoped samples with the same th
ickness. The mobility demonstrates a pronounced minimum around 300 K f
or the undoped sample. But for Si-doped samples, no pronounced minimum
has been found. Such abnormal behaviours are explained by the paralle
l conduction from the quasi-bulk carriers and interface carriers. Thes
e high-mobility InAs thin films are found to be suitable materials for
making Hall elements. (C) 1998 Elsevier Science B.V. All rights reser
ved.