GROWTH AND TRANSPORT-PROPERTIES OF INAS THIN-FILMS ON GAAS

Citation
Hw. Zhou et al., GROWTH AND TRANSPORT-PROPERTIES OF INAS THIN-FILMS ON GAAS, Journal of crystal growth, 191(3), 1998, pp. 361-364
Citations number
21
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
191
Issue
3
Year of publication
1998
Pages
361 - 364
Database
ISI
SICI code
0022-0248(1998)191:3<361:GATOIT>2.0.ZU;2-5
Abstract
High-quality InAs epitaxial layers have been grown on (1 0 0) oriented semi-insulating GaAs substrates by MBE. The transport properties of l argely lattice mismatched InAs/GaAs heterojunctions have been investig ated by Hall effect measurements down to 10 K. In spite of a high disl ocation density at the heterointerface, very high electron mobilities are obtained in the InAs thin films. By doping Si into the layer far f rom the InAs/GaAs interface, we found that the doped samples have high er electron mobility than that of the undoped samples with the same th ickness. The mobility demonstrates a pronounced minimum around 300 K f or the undoped sample. But for Si-doped samples, no pronounced minimum has been found. Such abnormal behaviours are explained by the paralle l conduction from the quasi-bulk carriers and interface carriers. Thes e high-mobility InAs thin films are found to be suitable materials for making Hall elements. (C) 1998 Elsevier Science B.V. All rights reser ved.