MONOCRYSTALLINE SI WAFFLES FOR THIN SOLAR-CELLS FABRICATED BY THE NOVEL PERFORATED-SILICON PROCESS

Citation
R. Brendel et al., MONOCRYSTALLINE SI WAFFLES FOR THIN SOLAR-CELLS FABRICATED BY THE NOVEL PERFORATED-SILICON PROCESS, Applied physics A: Materials science & processing, 67(2), 1998, pp. 151-154
Citations number
19
Categorie Soggetti
Physics, Applied
ISSN journal
09478396
Volume
67
Issue
2
Year of publication
1998
Pages
151 - 154
Database
ISI
SICI code
0947-8396(1998)67:2<151:MSWFTS>2.0.ZU;2-X
Abstract
We apply the novel perforated-silicon process (''psi-process'') for th e fabrication of thin (a few microns thick) monocrystalline silicon la yers for solar cells with textured surfaces for efficient light trappi ng. A silicon layer grows epitaxially on the porous surface of a textu red monocrystalline Si substrate. Mechanical stress splits the porous layer and thereby separates the epitaxial layer from the substrate. X- ray diffraction analysis proves monocrystallinity for our 5.8-mu m-thi ck Si layer. Ray tracing simulations correctly model the optical refle ctance measurements. The simulations predict a maximum short-circuit c urrent of 36.5 mA/cm(2) for this waffle-shaped film when it is attache d to glass substrates.