OBSERVATION OF AL SURFACE DURING SPUTTER-CLEANING AND ANNEALING PROCEDURES UNDER UHV-REM

Authors
AKITA T NAGATA T KIMURA Y TAKAI Y SHIMIZU R
Citation
T. Akita et al., OBSERVATION OF AL SURFACE DURING SPUTTER-CLEANING AND ANNEALING PROCEDURES UNDER UHV-REM, Journal of Electron Microscopy, 47(3), 1998, pp. 223-226
Citations number
9
Categorie Soggetti
Microscopy
Journal title
Journal of Electron Microscopy → ACNP
ISSN journal
00220744
Volume
47
Issue
3
Year of publication
1998
Pages
223 - 226
Database
ISI
SICI code
0022-0744(1998)47:3<223:OOASDS>2.0.ZU;2-N
Abstract
Clean surfaces of aluminum obtained by repeated sputter-cleaning and a nnealing were observed using UHV-reflection electron microscopy (REM) equipped with an infrared heating apparatus and an in situ ion gun. Si gnificant observations are: (i) ion bombardment produces a characteris tic corn-formation structure composed of single crystals on the surfac es; and (ii) successive sputter-cleaning followed by annealing resulte d finally in a well defined flat and smooth surface. Atomically flat a reas and steps were effectively defined.