SURFACE-ROUGHNESS OF OXIDIZED COPPER-FILMS STUDIED BY ATOMIC-FORCE MICROSCOPY AND SPECTROSCOPIC LIGHT-SCATTERING

The interface roughness of Cu2O films produced by thermal oxidation of Cu was studied by spectroscopic elastic light scattering and atomic f orce microscopy. No correlation could be found between the roughness o f the two interfaces, although the amplitude and the length scale of t he roughness changed in the same way with film thickness for both inte rfaces. Both interfaces were found to have a fractal dimension of two. A first order perturbation theory was used to analyse the light scatt ering data; theory and experiment are in good agreement within the lim its of the theory. (C) 1998 Elsevier Science S.A. All rights reserved.