ADSORPTION-CONTROLLED GROWTH OF PBTIO3 BY REACTIVE MOLECULAR-BEAM EPITAXY

Citation
Cd. Theis et al., ADSORPTION-CONTROLLED GROWTH OF PBTIO3 BY REACTIVE MOLECULAR-BEAM EPITAXY, Thin solid films, 325(1-2), 1998, pp. 107-114
Citations number
58
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
325
Issue
1-2
Year of publication
1998
Pages
107 - 114
Database
ISI
SICI code
0040-6090(1998)325:1-2<107:AGOPBR>2.0.ZU;2-I
Abstract
Epitaxial lead titanate films have been grown on (001) SrTiO3 substrat es by reactive molecular beam epitaxy (MBE). Growth of stoichiometric phase-pure epitaxial PbTiO3 films is achieved by supplying a continuou s excess of lead and ozone to the surface of the depositing film. Resu lts obtained from RES composition analysis, measured film thicknesses and flux measurements using atomic absorption spectroscopy (AA) indica te that the film growth rate is completely determined by the incident titanium flux supplied to the surface. Atomic force microscopy (AFM) r esults show that films grow smoothly in a layer-by-layer fashion with an RMS roughness of < 0.5 nm. The sticking coefficient of titanium is determined to be approximately unity while the excess lead, lead oxide and ozone desorb. Lead and ozone beam equivalent pressures have been measured in the MBE environment. Thermodynamic analysis is used to hel p describe the processes that prevent the incorporation of PbO into fi lms under adsorption-controlled growth conditions. (C) 1998 Elsevier S cience S.A. All rights reserved.