We describe the design and use of a novel scanning microscope which de
tects changes in electric potential above a surface. We demonstrate th
at this can be employed to image integrated circuits of considerable c
omplexity in various modes of operation and at a spatial resolution of
similar or equal to 1 mu m. We discuss the advantages of applying thi
s imaging technique to the non-invasive evaluation of very large scale
integrated circuits and consider possible limits to its resolution an
d sensitivity in this role.