PD(II)-CATALYZED ADDITION POLYMERIZATION AND RING-OPENING METATHESIS POLYMERIZATION OF ALICYCLIC MONOMERS - ROUTES TO NEW MATRIX RESINS FOR193 NM PHOTOLITHOGRAPHY

A series of alicyclic polymers designed for 193 nm photoresist applica tions have been synthesized and characterized. These polymers were syn thesized by Pd(II)-catalyzed addition and ring opening metathesis poly merization techniques. Methods for removing residual metal complexes o f Pd(II) and Ir(IV) from alicyclic polymers were developed. The low ab sorbance of these polymers at 193 nm and their high dry etch resistanc e make them attractive candidates for 193 nm lithography. When formula ted with onium-type photoacid generators and plasticizers in propylene glycol monomethyl ether acetate, these photoresists have demonstrated high resolution and high sensitivity. (C) 1998 Elsevier Science B.V. All rights reserved.