THE EFFECT OF NITROGEN PRESSURE ON THE SOFT-MAGNETIC PROPERTIES OF FETIN FILMS

FeTiN films with good soft magnetic properties were prepared by facing target sputtering (FTS). The magnetic properties of the films are ver y sensitive to nitrogen partial pressure P-N2. The FeTiN films with 5 and 12 at% Ti contents deposited at P-N2 = 0.05 and 0.07 Pa exhibit sa turation magnetization 4 pi M-S = 2.5 and 2.36 T, and good soft magnet ic properties such as low coercivity H-c approximate to 2Oe and high p ermeability approximate to 3000. The thermal stability of these films was also found to be good, e.g., H-c was less than 3Oe and 4 pi M-S wa s higher than 2.3 T for the films annealed up to 500 degrees C.